Manuals >Nonlinear Device Models Volume 1 >BSIM3v3 Characterization
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SPICE Model Parameters

The model parameters of the BSIM3v3 model can be divided into several groups. The main model parameters are used to model the key physical effects in the DC and CV behavior of submicron MOS devices at room temperature. Here they are grouped into subsections related to the physical effects of the MOS transistor. The second group are the process related parameters. They should only be changed if a detailed knowledge of a certain MOS production process is given. The third group of parameters are the temperature modeling parameters. The following two groups are used to model the AC and noise behavior of the MOS transistor. Finally the last group contains flags to select certain modes of operations and user definable model parameters. For more details about these operation modes refer to the BSIM3v3 manual [1].

Main Model Parameters

Table 58 Main Model Parameters 
Parameter
Description
Default Value
(NMOS/PMOS)

Unit
Threshold Voltage
VTHO
Ideal threshold voltage
0.7/-0.7
V
K1
First-order body effect coefficient
0.5
V0.5
K2
Second-order body effect coefficient
0.5
-
K3
Narrow width coefficient
80.0
-
K3B
Body effect coefficient of K3
0.0
1/V
W0
Narrow width parameter
2.5E-6
m
NLX
Lateral non-uniform doping coefficient
1.74E-7
m
VBM
Maximum applied body bias in VTH calculation
-5.0
V
DVT0
First coefficient of short-channel effect on VTH
2.2
-
DVT1
Second coefficient of short-channel effect on VTH
0.53
-
DVT2
Body-bias coefficient of short-channel effect on VTH
-0.032
1/V
DVT0W
First coefficient of narrow-channel effect on VTH
2.2
-
DVT1W
Second coefficient of narrow-channel effect on VTH
5.3E6
-
DVT2W
Body-bias coefficient of narrow-channel effect on VTH
-0.032
1/V
ETA0
DIBL coefficient in the subthreshold region
0.08
-
ETAB
Body-bias for the subthreshold DIBL effect
-0.07
1/V
DSUB
DIBL coefficient in subthreshold region
DROUT
-
Mobility
U0
Mobility
670 / 250
cm2/(Vs)
UA
First-order mobility degradation coefficient
2.25E-9
m/V
UB
Second-order mobility degradation coefficient
5.87E-19
(m/V)2
UC
Body-effect of mobility degradation
-4.65E-11
(m/V)2
Drain current
VSAT
Saturation velocity
8.0E6
cm/s
A0
Bulk charge effect coefficient
1.0
-
A1
First non saturation factor
0/0.23
1/V
A2
Second non saturation factor
1.0/0.08
-
AGS
Gate-bias coefficient of Abulk
0.0
1/V
B0
Bulk charge effect coeff. for channel width
0.0
m
B1
Bulk charge effect width offset
0.0
m
KETA
Body-bias coefficient of the bulk charge effect.
-0.047
1/V
Subthreshold region
VOFF
Offset voltage in the subthreshold region
-0.11
V
NFACTOR
Subthreshold swing factor
1.0
-
CIT
Interface trap density
0
F/m2
CDSC
Drain-Source to channel coupling capacitance
2.4E-4
F/m2
CDSCB
Body-bias coefficient of CDSC
0
F/Vm2
CDSCD
Drain-bias coefficient of CDSC
0
F/Vm2
Drain-source resistance
RDSW
Parasitic resistance per unit width
0
m
WR
Width offset from Weff for RDS calculation
1.0
-
PRWB
Body effect coefficient of RDSW
0
V-0.5
PRWG
Gate bias effect coefficient of RDSW
0
1/V
Channel geometry
WINT
Channel width reduction on one side
0
m
WL
Coeff. of length dependence for width offset
0
m
WLN
Power of length dependence for width offset
1
-
WW
Coeff. of width dependence for width offset
0
m
WWN
Power of width dependence for width offset
1
-
WWL
Coeff. of length and width cross term for width offset
0
m
LINT
Channel length reduction on one side
0
m
LL
Coeff. of length dependence for length offset
0
m
LLN
Power of length dependence for length offset
1
-
LW
Coeff. of width dependence for length offset
0
m
LWN
Power of width dependence for length offset
1
-
LWL
Coeff. of length and width cross term for length offset
0
m
DWG
Coefficient of Weff's gate dependence
0
m/V
DWB
Coefficient of Weff's substrate dependence
0
m/V0.5
Output resistance
PCLM
Channel length modulation coefficient
1.3
-
PDIBLC1
First output resistance DIBL effect
0.39
-
PDIBLC2
Second output resistance DIBL effect
0.0086
-
PDIBLCB
Body effect coefficient of output resistance DIBL effect
0
1/V
DROUT
L dependent coefficient of the DIBL effect in output resistance
0.56


PSCBE1
First substrate current body-effect coefficient
4.24E8
V/m
PSCBE2
Second substrate current body-effect coefficient
1.0E-5
m/V
PVAG
Gate dependence of Early voltage
0
-
ALPHA0
The first parameter of impact ionization
0
m/V
ALPHA1
Length dependent substrate current parameter
0
1/V
BETA0
The second parameter of impact ionization
30


Diode characteristic
JS
Source drain junction saturation density
1E-4
A/m2
JSSW
Side wall saturation current density
0
A/m
NJ
Emission coefficient of junction
1
-
IJTH
Diode limiting current
0.1
A
Capacitance
CJ
Source/drain bottom junction capacitance per unit area
5.0E-4
F/m2
CJSW
Source/drain side junction capacitance per unit length
5.0E-10
F/m
CJSWG
Source/drain gate side junction capacitance per unit length
CJSW
F/m
MJ
Bottom junction capacitance grading coefficient
0.5
-
MJSW
Source/drain side junction capacitance grading coefficient
0.33
-
MJSWG
Source/drain gate side junction cap. grading coefficient
MJSW
-
PB
Bottom junction built-in potential
1.0
V
PBSW
Source/drain side junction built-in potential
1.0
V
PBSWG
Source/drain gate side junction built-in potential
PBSW
V
CGSO
Gate-source overlap capacitance per unit W
XJ*COX/2
F/m
CGDO
Gate-drain overlap capacitance per unit W
XJ*COX/2
F/m
GGBO
Gate-bulk overlap capacitance per unit W
0.0
F/m
CGSL
Light doped source-gate region overlap capacitance
0.0
F/m
CGDL
Light doped drain-gate region overlap capacitance
0.0
F/m
CKAPPA
Coefficient for lightly doped region overlap
0.6
F/m
CF
Fringing field capacitance
-
F/m
CLC
Constant term for the short channel model
0.1E-6
m
CLE
Exponential term for the short channel model
0.6


DLC
Length offset fitting parameter from C-V
LINT
m
DWC
Width offset fitting parameter from C-V
WINT
m
NOFF
Subthreshold swing factor for CV model
1
-
VOFFCV
Offset voltage for CV model
0
V

Process Related Parameters

Table 59 Process Related Parameters 
Parameter
Description
Default Value
Unit
TOXM
Gate oxide thickness at which parameters are extracted
15e-9
m
TOX
Gate oxide thickness
15E-9
m
XJ
Junction depth
150E-9
m
NCH
Doping concentration near interface
1.7E17
1/cm³
NSUB
Doping concentration away from interface
6E16
1/cm³
NGATE
Poly gate doping concentration
0
1/cm3
VFB
Flat-band voltage
-1.0
V
gamma1
Body-effect near interface

gamma2
Body-effect far from interface




XT
Doping depth
1.55E-7
V
RSH
Source/Drain Sheet resistance
0

Temperature Modeling Parameters

Table 60 Temperature Modeling Parameters
Parameter
Description
Default Value
Unit
UTE
Mobility temperature coefficient
-1.5
-
KT1
Threshold voltage temperature coefficient
-0.11
V
KT1L
Channel length dependence of KT1
0.0
Vm
KT2
Threshold voltage temperature coefficient
0.022
-
UA1
Temperature coefficient for UA
4.31E-19
m/V
UB1
Temperature coefficient for UB
-7.61E-18
(m/V)2
UC1
Temperature coefficient for UC
-0.056
m/V2
PRT
Temperature coefficient for RDSW
0.0
m
AT
Saturation velocity temperature coefficient
3.3E4
m/s
XTI
Junction current temperature exponent coefficient
3.0
-
TPB
Temperature coefficient for PB
0
V/K
TPBSW
Temperature coefficient for PBSW
0
V/K
TPBSWG
Temperature coefficient for PBSWG
0
V/K
TCJ
Temperature coefficient for CJ
0
1/K
TCJSW
Temperature coefficient for CJSW
0
1/K
TCJSWG
Temperature coefficient for CJSWG
0
1/K

Flicker Noise Model Parameters

Table 61 Flicker Noise Model Parameters 
Parameter
Description
Default Value
(NMOS/PMOS)

Unit
NOIA
Noise parameter A
1E20 / 9.9E18
-
NOIB
Noise parameter B
5E4 / 2.4E3
-
NOIC
Noise parameter C
-1.4E-12 / 1.4E12
-
EM
Saturation field
4.1E7
V/m
AF
Frequency exponent
1
-
EF
Flicker exponent
1
-
KF
Flicker noise parameter
0
-
LINTNOI
Length reduction parameter offset
0
m

Non-Quasi-Static Model Parameters

Table 62 Non-Quasi-Static Model Parameter
Parameter
Description
Default Value
Unit
ELM
Elmore constant of the channel
5
-

Model Selection Flags

Table 63 Model Selection Flags 
Parameter
Value
Type of Model
LEVEL
8
BSIM3v3 model selector (in UCB SPICE)
MOBMOD
1
Mobility model
 
2
 
 
3
 
CAPMOD
0
Capacitance model
 
1
 
 
2
 
 
3
 
NQSMOD
0
Non quasi static model
 
1
 
ACNQSMOD
0
introduced from BSIM4


1


NOIMOD
1
Noise model
 
2
 
 
3
 
 
4
 


5
new thermal noise / SPICE2 flicker noise


6
new thermal noise / BSIM3 flicker noise

User Definable Parameters

Table 64 User Definable Parameters
Parameter
Description
Default Value
Unit
XPART
Charge partitioning coefficient
0
-
DELTA
Parameter for smoothness of effective Vds calculation
0.01
-

Additional Parameters needed for accurate RF modeling

Table 65 RF Parameters for the RF subcircuit 
Parameter
Description
Default Value
Unit
RSHB
bulk sheet resistance
25

DGG
distance between gate stripes
2E-6
m
DSCB
distance source to bulk contact
2E-6
m
DDCB
distance drain to bulk contact
2E-6
m
RBDB
resistance between bulk connection point and drain
100

RBSB
resistance between bulk connection point and source
100

RBPD
resistance between the region below the channel and the drain region
100

RBPS
resistance between the region below the channel and the source region
100


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