Manuals >Nonlinear Device Models Volume 1 >BSIM4 Characterization
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Basic Effects Modeled in BSIM4

    • Short and narrow channel effects on threshold voltage
    • Non-uniform doping effects
    • Mobility reduction due to vertical field
    • Bulk charge effect
    • Carrier velocity saturation
    • Drain induced barrier lowering (DIBL)
    • Channel length modulation (CLM)
    • Substrate current induced body effect (SCBE)
    • Parasitic resistance effects
    • Quantum mechanic charge thickness model
    • Well proximity effect
    • Enhanced temperature mode (TempMod=2)
    • Enhanced mobility model using Leff dependency

Enhanced drain current model

    • VTH model for pocket/retrograde technologies
    • New predictive mobility model
    • Gate induced drain leakage (GIDL)
    • Internal/external bias-dependent drain source resistance

RF and high-speed model

    • Intrinsic input resistance (Rgate) model
    • Non-Quasi-Static (NQS) model
    • Holistic and noise-partition thermal noise model
    • Substrate resistance network
    • Calculation of layout-dependent parasitic elements
    • Asymmetrical source/drain junction diode model
    • I-V and breakdown model
    • Gate dielectric tunneling current model

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